- Product description
- Specification parameters
- Hardware options
RTP-Table-6 is a desktop 6-inch wafer Rapid Thermal Processing. It uses upper and lower layers of infrared halogen lamps as heat sources to heat the internal quartz cavity for insulation. The cavity shell is made of water-cooled aluminum alloy, allowing the product to be heated evenly and the surface temperature is low.
RTP-Table-6 adopts PID control, and the system can quickly adjust the output power of infrared halogen tubes, making the temperature control more accurate.
industry application
Ion implantation annealing
Rapid annealing after ITO coating
oxide
nitride growth
Silicide alloy annealing
GaAs process
Ohmic contact fast alloy
Oxidation reflux
Other semiconductor rapid heat treatment processes
Product Advantages
No data
Maximum product size 6-inch wafer or product with maximum support of 150*150mm
temperature range Room temperature ~1250℃
Temperature control method Fast PID temperature control
temperature uniformity ±5℃≤500℃ ±1%＞500℃
